| Introduction: The line can plates metallic film, alloy film or metal compound films on the surface of the plate glass, acrylic sheet. Through using different structure's target and the different target material, deposits one or multi-layered nanometer coating on the surface of material. Can use in the LOW-E glass coating, the heat-reflection glass coating, the glass decoration film, the EMI electromagnetism screened film, the metal ultra hard membrane and so on. |
Main Features:
1. Uses the new plane and the columnar magnetic control sputtering target technology, enhances the coating effect and the efficiency.
2. The multi-vacuum chambers, the multi-sputtering chamber structure, may for the user choice, between the vacuum chamber have the vacuum lock to isolate
3. Provide the high accuracy magnetron power source, the gas flow amount and the speed control, the operation is simple, stable property.
4. The film uniformity is good, the adhesion is strong, degree of hardness is high, the corrosion resistivity is good, may plate many kinds of colors the membrane departments.
5. Vacuum chamber has the traditional vertical design and the highly effective horizontal-type design, satisfies the different level customer the need.
Main configuration:
The production line is composed of tipping rack, washing machine, attendant chamber, pre-pumping chamber, buffer chamber, sputtering coating chamber, output buffer chamber, output pre-pumping chamber, output washing machine, on-line inspection, un-loading tipping rack and control board system.
Technical Parameters:
|
Model
|
LJP-2000
|
LJP-2500
|
LJP-3300
|
|
Glass size
|
1500X2000
|
1880X2440
|
2440X3300
|
|
Takt time (min/piece)
|
3
|
3
|
3
|
|
Ultimate vacuum（Pa）
|
2X10-3
|
2X10-3
|
2X10-3
|
|
Targets（sets）
|
3
|
3
|
3
|
|
Sputtering Power（KW）
|
80X3
|
80X3
|
100X3
|
|
Vacuum Chambers（个）
|
9
|
9
|
9
|
|
